Meet 1-on-1 with a Leeway staffer to receive direct feedback on your Media Artist + Activist Residency (MAR) application before the June 24th deadline.
Leeway staff will be available from 10am-3pm to meet with applicants on a first come, first serve basis. While advance registration is not required, we encourage you to RSVP so we have a sense of how many folks might join us.
Snacks and light refreshments will be available.
THERE WILL BE A SPANISH LANGUAGE INTERPRETER ON SITE.
HABRÁ UN INTÉRPRETE DE ESPAÑOL DISPONIBLE.
Can’t make this session?
You may be able to join us for one of the following Application Support sessions:
About the Media Artist + Activist Residency (MAR)
The Media Artist + Activist Residency (MAR) provides grants of $25,000 to media artists working in close collaboration with social justice/cultural organizations to document, reframe, and/or amplify the issues and campaigns addressed by the organization. Learn more about Leeway's grant programs here.
COVID-19 Protocol
Masks are required and must be worn at all times. If you do not have a mask, one will be provided. Let’s keep each other safe.
Venue Accessibility
The session will take place at Asian Arts Initiative in Studio B, an ADA accessible space. Asian Arts Initiative is designed as a mobility accessible facility, with access to all public floors and spaces, and seating accommodations for programmed events. Both non-gendered and individually isolating restrooms are available on each floor, all equipped with changing stations.
Accommodations
ASL interpretation and childcare available by request when you RSVP at least two weeks ahead of the session date. Please let us know if you require these or any other accommodations in the event registration form. We’ll do our best to accommodate.
