$75 – $160

The Meeting for Advanced Electron Beam Lithography (MAEBL)

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The California Institute of Technology

1200 E California Blvd

Pasadena, CA 91125

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Refund Policy

Refund Policy

Refunds up to 7 days before event

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The 4th annual Meeting for Advanced Electron Beam Lithography (MAEBL) will be hosted by the California Institute of Technology Monday-Tuesday, April 6-7, 2020.

MAEBL is a two day event that brings together the brightest minds in electron beam lithography throughout North America. The first day features the MAEBL Foundations Workshop geared for novice/beginners in electron beam lithography and is highly recommended for academic researchers seeking guidance during the onset of their nano-lithographic work. Learn the fundamentals in machine agnostic tool operation, data preparation, process development, etc. Novice to advanced e-beam lithographers are invited to participate in the Foundations Workshop to learn, brush-up or help mentor others on the fundamentals of EBL. Advanced attendees are encouraged to impart personal accounts and challenges to the audience, elevating the workshop experience. At the end of the meeting beginners should be conversant in EBL and are encouraged to participate in day two: the MAEBL Core Workshop

Day Two is the Core Workshop that started it all. Be part of the conversation and learn something new (or old). Arrive early to network, receive your name badge and to grab a coffee/light continental breakfast. Bring your business cards, laptop computer with designs and SEM images of your issues and an open mind. The goal of the meeting is to connect active novice to experienced EBL tool owners and users to openly exchange practical and directly applicable EBL knowledge in an open forum format. The event features invited talks from users in the field. In the years past, attendees have networked with like minded researchers and scientists and witnessed invited talks from Argonne National Laboratory, the National Institute of Standards and Technology, IBM, Ohio State University, The Pennsylvania State University, the University of Delaware, Brookhaven National Laboratory, Caltech, Yale, the University of Pennsylvania, Sandia National Laboratory and MIT (to name a few).


Program Highlights:

  • Over 4 hours of programmed networking, including two 30 minute coffee breaks and an hour for lunch.
  • Common Challenges, our open forum group discussion promotes engagement by allowing users to pose open questions to the attendees.

Topics of discussion include but are not limited to:

  • Proximity Effect Correction
  • Resist Characterization
  • Scripting and Automation
  • Pattern Fidelity Enhancement
  • Throughput Enhancement
  • Pattern Transfer (Etch and/or Lift-off)
  • Anti-charging
  • Field Stitching
  • Beam Drift
  • Image Processing
  • Data Preparation
  • Simulation
  • Device Fabrication

REGISTRATION
Registration helps to defer food costs for the venue. To qualify to attend, you must be an active EBL tool owner/user at a recognized academic, industry, or government lab and must sign up using your institution's e-mail. On-site registration will not be available. You must sign-up online in advance. Thank you for your understanding.

PARKING
On site parking is available at 370 South Holliston Ave, Pasadena, CA 91106. Parking is $9/day.

GETTING HERE
You can fly into the Los Angeles International Airport (LAX) or Hollywood Burbank Airport (BUR). It is about an hour drive from LAX, and a 30 minute drive from BUR.

HOTELS
There are over a dozen hotels that span E Colorado Blvd which translates to 5-15 minute cab ride depending on where you stay. Hotel night stays are as low as $85 per night.

REFUNDS
Registration refunds are available until March 30, 2020 (7 days prior to the event date); this means refunds cannot be issued beginning March 30, 2020, due to the catering reservation.

ABOUT MAEBL
Go to www.maebl.org

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Date and Time

Location

The California Institute of Technology

1200 E California Blvd

Pasadena, CA 91125

View Map

Refund Policy

Refunds up to 7 days before event

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