$75

The Meeting for Advanced Electron Beam Lithography (MAEBL)

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Location

Location

The Ohio State University

The Ohio Union in the Cartoon Room

1739 N High Street

Columbus, OH 43210

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Refund Policy

Refund Policy

Refunds up to 7 days before event

Event description

Description

The 3rd annual Meeting for Advanced Electron Beam Lithography (MAEBL) workshop will be hosted by The Ohio State University on Wednesday, April 3, 2019, from 7:30 AM to 6:00 PM. The program will begin at 8:30 AM. Arrive early to network, receive your name badge and to grab a coffee/light continental breakfast. Bring your business cards, laptop computer with designs and SEM images of your issues and an open mind. The goal of the meeting is to connect active novice to experienced EBL tool owners and users to openly exchange practical and directly applicable EBL knowledge in an open forum format. The event features invited talks from users in the field. In the years past, attendees have networked with like minded researchers and scientists and witnessed invited talks from Argonne National Laboratory, the National Institute of Standards and Technology, IBM, Ohio State University, The Pennsylvania State University, the University of Delaware, and Brookhaven National Laboratory.


Program Highlights:

  • Download the 2019 program!
  • We've programmed in over 4 hours of networking! This includes two 30 minute coffee breaks and over an hour for lunch.
  • Common Challenges, our open forum group discussion, will be split into two parts: morning and afternoon. If you have a topic you'd like to share or discuss, please check the program for details on how to submit.
  • Finally, we have a few guest speakers to share about their experiences in managing tool artefacts to improve lithographic fidelity.


Topics of discussion include but are not limited to:

  • Proximity Effect Correction
  • Resist Characterization
  • Scripting and Automation
  • Pattern Fidelity Enhancement
  • Throughput Enhancement
  • Pattern Transfer (Etch and/or Lift-off)
  • Anti-charging
  • Field Stitching
  • Beam Drift
  • Image Processing
  • Data Preparation
  • Simulation
  • Device Fabrication

The MABEL 2019 Program: Download


REGISTRATION
Registration helps to defer food costs for the venue. To qualify to attend, you must be an active EBL tool owner/user at a recognized academic, industry, or government lab and must sign up using your institution's e-mail. On-site registration will not be available. You must sign-up online in advance. Thank you for your understanding. General Registration is $75 and is available until April 3, 2019.

PARKING
Parking is available on site: http://osu.campusparc.com/home/garages/academic-south-campus/ohio-union-south

GETTING HERE
If you're arriving by plane, you'll want to fly into the John Glenn International Airport (airport code: CMH). The airport is located 6 miles (10 kilometers) east of downtown Columbus.


HOTELS
The Blackwell (this is the only hotel that is on campus)
614-247-4000
2110 Tuttle Park Pl, Columbus, OH 43210

Fairfield Inn and Suites - OSU
614-267-1111
3031 Olentangy River Rd, Columbus, OH 43202

Hampton Inn and Suites - University Area
614-268-8700
3160 Olentangy River Rd, Columbus, OH 43202

Hilton Garden Inn- University Area
614-263-7200
3232 Olentangy River Rd, Columbus, OH 43202

Holiday Inn Suites - OSU
614-447-1212
3045 Olentangy River Rd, Columbus, OH 43202

Homewood Suites by Hilton - OSU
614-488-1500
1576 W Lane Ave, Columbus, OH 43221

Hyatt Place - Columbus/OSU
614-280-1234
795 Yard St, Columbus, OH 43212

Marriott - Columbus University Area
614-447-9777
3100 Olentangy River Rd, Columbus, OH 43202

Residence Inn - Columbus University Area
614-261-7994
3100 Olentangy River Rd, Columbus, OH 43202

Springhill Suites – Columbus Ohio State University
614-297-9912
1421 Olentangy River Rd, Columbus, OH 43212


REFUNDS
Registration refunds are available until March 27, 2019 (7 days prior to the event date); this means refunds cannot be issued beginning March 27, 2019, due to the catering reservation.

ABOUT MAEBL
The Meeting for Advanced Electron Beam Lithography (MAEBL), formerly Mid-Atlantic Electron Beam Lithography, was conceived in 2016 during the Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN) conference in Pittsburgh, PA. Its mission is to connect active novice to experienced EBL tool owners and users to exchange practical and directly applicable knowledge. As a small and geographically dispersed and vendor segmented community, the meeting provides an intimate space to so its members can openly discuss topics devoid of conference formality and EBL hardware vendors/exhibitors. In its third year, MAEBL continues to help promote this dialogue within the segmented EBL community by holding fast to its tradition in allowing only the end-users of these state-of-the-art systems.

Today, MAEBL is community of engineers, scientists and students from industry, academia, and government that use EBL to enable cutting edge research and development. Structured talks, lectures and planned discussions in addition to over three hours of networking is built into the one-day program.

On April 19, 2017, over 60 registered for the first MAEBL to discuss best practices, computational efforts and the state-of-the art techniques for fine feature patterning in electron beam lithography.

The 2nd MAEBL was held again at the University of Pennsylvania Singh Center for Nanotechnology on April 23, 2018.

Both meetings combined, talks by The Ohio State University, the University of Pennsylvania, The Pennsylvania State University, the University of Delaware, Massachusetts Institute of Technology (MIT), Argonne National Laboratory, Brookhaven National Laboratory, IBM Research and MIT Lincoln Laboratory have been witnessed by the attendees representing Carnegie Mellon University, City University of New York, Columbia University, Cornell University, George Washington University, Georgia Institute of Technology, National Research Council of Canada, North Carolina A&T State University, Northwestern University, Princeton University, University of California San Diego, University of California Santa Barbara, The National Research Council Canada and the University of Washington to name a few.

As part of its continuing mission, MAEBL enters its third year at The Ohio State University on Wednesday, April 3, 2019. New to 2019, we are grateful for the support of our MAEBL Charter Sponsors: JEOL USA, Raith Nanofrabrication, STS-Elionix, AllResist and LatticeGear.

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Date and Time

Location

The Ohio State University

The Ohio Union in the Cartoon Room

1739 N High Street

Columbus, OH 43210

View Map

Refund Policy

Refunds up to 7 days before event

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