The Meeting for Advanced Electron Beam Lithography (MAEBL)

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The Meeting for Advanced Electron Beam Lithography (MAEBL)

MAEBL 2023 is a hybrid event that brings together a global community of electron beam lithographers.

By Gerald Lopez

When and where

Date and time

September 12 · 8am - September 14 · 6pm CDT

Location

University of Chicago 5640 S. Ellis Avenue Chicago, IL 60637

Refund Policy

No Refunds

About this event

  • 2 days 10 hours
  • Mobile eTicket

The 7th Meeting for Advanced Electron Beam Lithography (MAEBL - www.maebl.org) will be hosted virtually and in-person bringing together the brightest minds in electron beam lithography from around the world. This year, engagement will be fostered by hosting events virtually and in person across different time zones. The University of Chicago Pritzker Nanofabrication Facility will host the Foundations Workshop and Core Meetings. Bonus MAEBLx meetings will be in the afternoon of their respective region. View the MAEBL 2023 Program

MAEBL Meetings

  • MAEBLx EBL Vendor Applications (1-4p EDT): Wednesday, May 3, 2023
  • MAEBLx Asia-Pacific (AEDT): TBD
  • MAEBL 2023 Host Tour and Operations (1-5p CDT): Tuesday, September 12, 2023
  • MAEBL 2023 Foundations Workshop (9a-5p CDT): Wednesday, September 13, 2023
  • MAEBL 2023 Core Meeting (8a-5p CDT): Thursday, September 14, 2023
  • MAEBLx North America (2-4p EST): Wednesday, November 15, 2023

Program Highlights:

  • View the MAEBL 2023 Program
  • Full Registration ($175) provides full access to MAEBL 2023 and the bonus MAEBLx meetings scheduled in their respective time zones.
  • NEW: Student Registration ($87.50) has been created to encourage growth in student participation online or in person.
  • Exclusive access to the MAEBL GatherTown space, SLACK channels, and invited speakers.
  • Open discussions in our Common Challenges segment, to pose live questions to the MAEBL community comprised of a serious group of EBL experts who love to share their knowledge.
  • No nonsense EBL shop talk. More application than theory for the EBL practitioner.

Topics of discussion include but are not limited to:

  • Proximity Effect Correction
  • Resist Characterization
  • Scripting and Automation
  • Pattern Fidelity Enhancement
  • Throughput Enhancement
  • Pattern Transfer (Etch and/or Lift-off)
  • Anti-charging
  • Field Stitching
  • Beam Drift
  • Image Processing
  • Data Preparation
  • Simulation
  • Device Fabrication

REGISTRATION and QUALIFICATIONS TO REGISTER

Registration helps to offset the operational costs of the meeting series. A single registration is not for an organization; it is for an individual and is not transferrable.

All active EBL users and tool owners from academic, industry, or government institutions are encouraged to attend. To promote intimate dialogue, we have kindly requested that EBL hardware vendors refrain from registering. Attendance is granted to organizers, speakers, and non-EBL-hardware vendor sponsors. Advance online sign-up is required to participate as there will be no on-site registration. Please see https://goforward.uchicago.edu/visitor-information for further guidance for on-campus participation. Thank you for your cooperation and understanding.

Again, a single registration is for an individual (not an organization) and is not transferable. Please be mindful that we are a non-profit organization operated by volunteers. Anyone wishing to attend must register under their own name. An attempt to transfer registration undermines our mission and capacity to organize meetings for the electron beam lithography community.

ATTENDING IN PERSON

The health and safety of the MAEBL community are our primary concern. All attendees must abide by the host institution policies for on campus engagement (https://goforward.uchicago.edu/visitor-information). If you are attending in person, the host institution may require each attendee to be fully vaccinated and boosted. All attendees have the option to wear a face-covering regardless of vaccination status. In the event of contact tracing, your information may be shared with the MAEBL Board, host, or any other responsible entities.

HOTEL

MAEBL has room blocks reserved at $249/night at The Study at University of Chicago, 1227 E 60th St, Chicago, IL 60637.

Discounted Rate Expires: August 11, 2023

Book Reservations at: https://reservations.travelclick.com/114529?groupID=3886627

Booking with our hotel using the link above allows MAEBL to obtain courtesy blocks for future meetings.

PRIVACY POLICY

In case of contact tracing or room block fulfillment, your contact information may be shared with responsible entities. For all other purposes, your registration information will not be distributed without your consent.

REFUND POLICY

No refunds will be issued. Please be mindful that we are a volunteer operated non-profit organization. A single registration is for an individual, not an organization, and is not transferable. Anyone wishing to attend must register under their own name. An attempt to transfer registration undermines our mission and capacity to organize meetings for the electron beam lithography community. Thank you for your cooperation and understanding of this matter.

About the organizer

Organized by
Gerald Lopez