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Advanced plasma processing techniques

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The Garden Hotel Guangzhou

368 Huanshi East Road

Guangzhou Shi, Guangdong Sheng 510000

China

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Plasma processing is an essential tool for making the latest optoelectronic devices. From dry etching of laser facets to high density passivation understanding how the plasma can effect your device is vital to achieving the highest quality. Oxford Instruments Plasma Technology is at the forefront of plasma processing with a long history of developing innovative solutions to enable device performance to be pushed to the next level. This workshop will detail some of these latest developments with talks on plasma etching, Atomic Layer Deposition (ALD) and ICP CVD of dielectric films. Along side this users will detail their experiences and show how they have used our tools to deliver devices.
Experts from the UK and local users will be here to share their knowledge in an open environment so please come along and enjoy the talks but also to ask any questions that you have.
Talks to include:

Plasma dry etch processes for III-V materials devices
Ligang Deng, Oxford Instruments Plasma Technology

Low damage deposition by ICP CVD
Young Huang, Oxford Instruments Plasma Technology

Atomic layer deposition (ALD) for optoelectronic devices
Harm Knoops, Oxford Instruments Plasma Technology

Ion beam laser bar coatings
Ion beam group, Oxford Instruments Plasma Technology

High quality plasma deposition and etching processes for photonic materials and devices
Mr Lin LIU, Sun Yat-Sen University

Plus further talks to be announced.

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Date and Time

Location

The Garden Hotel Guangzhou

368 Huanshi East Road

Guangzhou Shi, Guangdong Sheng 510000

China

View Map

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