PerkinElmer Workshop for Inorganic Analysis
|Discover the latest technological advances in inorganic from our Product Specialists. Get practical advice to help solve your real-world challenges, and learn techniques that you can implement in your laboratory immediately.|
|8:30 am - 8:45 am||
|8:45 am - 9:00 am||
What's new at PerkinElmer
|9:00 am - 9:45 am||
Creating robust methods in ICP-OES: General discussion of radial/axial, choosing lines, avoiding optical interferences, how UDA is so useful.
|9:45 am - 10:30 am||
USP 232/233 update for Supplemental Manufactures: Here the latest news concerning upcoming regulations.
|10:30 am - 10:45 am||
|10:45 am - 11:45 am||
Interference reduction/removal in ICP-MS: General description of how KED and DRC work, and applications and advantages of both.
|12:00 pm - 1:00 pm||
|1:15 pm - 2:00 pm||
Interference removal methods in ICP-OES: Lecture/discussion/software demo of IECs versus MSF.
|2:00 pm - 3:00 pm||
Interference removal methods in ICP-MS: Best practices.
|3:00 pm - 3:30 pm||
Open forum for Q&A
Workshop is FREE of charge for all attendees.
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